Document Type

Article

Publication Date

12-2008

Abstract

This paper reports the experimental approaches to the fabrication of two-layer integrated phase masks and the fabrication of photonic crystal templates using the phase mask based on holographic lithography technique. The photonic crystal template is formed by exposing photoresist mixtures to five-beam interference patterns generated through the phase mask. The fabricated phase mask consists of two layers of orthogonally oriented gratings produced in a liquid crystal and photoresist mixture. A polymerization-induced phase separation preserves the grating structure during the exposure. The vertical spatial separation between two layers of gratings produces a phase difference among diffracted laser beams, which enables the holographic fabrication of diamondlike photonic crystal structures. The fabricated photonic crystal structure is consistent with simulations based on the five-beam interference. The two-layer phase mask opens up an opportunity of direct printing photonic structures.

Comments

© 2008 American Institute of Physics. Original published version available at https://doi.org/10.1063/1.3037234

Publication Title

Journal of Applied Physics

DOI

10.1063/1.3037234

Share

COinS
 
 

To view the content in your browser, please download Adobe Reader or, alternately,
you may Download the file to your hard drive.

NOTE: The latest versions of Adobe Reader do not support viewing PDF files within Firefox on Mac OS and if you are using a modern (Intel) Mac, there is no official plugin for viewing PDF files within the browser window.